Steven Shannon

Professor of Nuclear Engineering, Director of Nuclear Engineering Graduate Program

Dr. Steve Shannon works in the area of industrial applications of plasma discharges. Plasmas are currently used for everything from decorative enhancement of bathroom fixtures to fabrication of the next generation of micro- and nano- scale devices. Plasma systems for industrial applications is a multi-billion dollar industry. His research focuses on enhancing current plasma applications being used and developed today and developing new plasma applications for next generation material and device fabrication.

Education

Ph.D. 1999

Nuclear Engineering

University of Michigan

M.S.E. 1997

Nuclear Engineering

University of Michigan

B.S.E. 1995

Nuclear Engineering

University of Michigan

Research Description

Dr. Shannon's research is in the industrial applications of plasma discharges.

Publications

Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors
Shutayfi, M., Raj, A., Eapen, J., & Shannon, S. (2023), Annals of Nuclear Energy. https://doi.org/10.1016/j.anucene.2023.109997
Design, Modeling, and Analysis of a Compact-External Electromagnetic Pumping System for Pool-Type Liquid Metal-Cooled Fast Reactors
Shutayfi, M., Raj, A., Eapen, J., & Shannon, S. (2023), ANNALS OF NUCLEAR ENERGY, 193. https://doi.org/10.1016/j.anucene.2023.109997r
Effect of dielectric target properties on plasma surface ionization wave propagation
Morsell, J., Bhatt, N., Dechant, C., & Shannon, S. (2023), JOURNAL OF PHYSICS D-APPLIED PHYSICS, 56(14). https://doi.org/10.1088/1361-6463/acbfc9
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma
Xiao, Y., Brandon, J., Morsell, J., Nam, S. K., Bae, K. H., Lee, J.-Y., & Shannon, S. (2023), JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 41(3). https://doi.org/10.1116/6.0002496
Plasma surface ionization wave interactions with single channels
Morsell, J., Trosan, D., Stapelmann, K., & Shannon, S. (2023), PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(9). https://doi.org/10.1088/1361-6595/acf9c9
Verification and validation of the open-source plasma fluid code: Zapdos*,**
DeChant, C., Icenhour, C., Keniley, S., Gall, G., Lindsay, A., Curreli, D., & Shannon, S. (2023), COMPUTER PHYSICS COMMUNICATIONS, 291. https://doi.org/10.1016/j.cpc.2023.108837
Verification methods for drift-diffusion reaction models for plasma simulations
DeChant, C., Icenhour, C., Keniley, S., Lindsay, A., Gall, G., Hizon, K. C., … Shannon, S. (2023), PLASMA SOURCES SCIENCE & TECHNOLOGY, 32(4). https://doi.org/10.1088/1361-6595/acce65
Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation
Du, Y., Kruger, F., Nam, S. K., Lee, H., Yoo, S., Eapen, J., … Shannon, S. (2022), JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 40(5). https://doi.org/10.1116/6.0002008
Electron temperature measurements with a hairpin resonator probe in a pulsed low pressure capacitively coupled plasma
Peterson, D., Xiao, Y., Ford, K., Kraus, P., & Shannon, S. (2021), Plasma Sources Science and Technology, 5. https://doi.org/10.1088/1361-6595/ac02b2
Focus ring geometry influence on wafer edge voltage distribution for plasma processes
Xiao, Y., Du, Y., Smith, C., Nam, S. K., Lee, H., Lee, J.-Y., & Shannon, S. (2021), Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. https://doi.org/10.1116/6.0000981

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